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Electronic transport in hydrogenated microcrystalline silicon: similarities with amorphous silicon

机译:氢化微晶硅中的电子传输:与非晶硅的相似性

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摘要

Undoped hydrogenated microcrystalline silicon (μc-Si:H) layers were grown by the very high frequency glow discharge (VHF-GD) technique under various deposition conditions. The electronic transport properties under illumination were investigated by means of steady-state photoconductivity and steady-state photocarrier grating methods. Similarly to hydrogenated amorphous silicon (a-Si:H), power law dependencies as a function of the generation rate are observed for the photoconductivity, for the ambipolar diffusion length, and for the parameter (indicating the Fermi level). For μc-Si:H, as for a-Si:H, nearly constant product of (mobility × recombination time) of majority and minority carriers is observed as a function of the parameter . Based on these similarities, we assume that the electronic transport model developed for a-Si:H remains valid for μc-Si:H.
机译:通过超高频辉光放电(VHF-GD)技术在各种沉积条件下生长未掺杂的氢化微晶硅(μc-Si:H)层。通过稳态光电导和稳态光电导体光栅方法研究了照明下的电子传输性能。与氢化非晶硅(a-Si:H)相似,对于光导率,双极性扩散长度和参数(表示费米能级),观察到幂律与生成速率的关系。对于μc-Si:H,与a-Si:H一样,观察到多数载流子和少数载流子的(迁移率×重组时间)几乎恒定的乘积随该参数的变化。基于这些相似性,我们假设为a-Si:H开发的电子传输模型对于μc-Si:H仍然有效。

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